Central Advanced Instrumentation Facilities

Pulsed Laser Deposition (PLD) System:

Gel Permeation Chromatographic system
This is the Advanced Pulsed Laser Deposition systems with in situ RHEED are state-of-the-art, highly flexible PLD systems for thin film research at the atomic level, ideally suited and field proven for research on a large variety of materials including complex Oxides. The systems offer full flexibility in altering and investigating the essential parameters such as gas mixtures, process pressure, fluence, target-to-substrate distance and substrate temperature with the highest possible accuracy.

Make & Model : TSST, Advanced PLD with in situ RHEED System
Installation Date : 10.12.2019
Current Location : Room no. – 05, Ground floor

Important Features of the System:

  1. Thin film growth of highest quality complex materials.
  2. Single monolayer growth control with RHEED.
  3. Down to 5.0x10-10 mbar base pressure.
  4. Up to 1100°C growth temperature.
  5. Up to 6 odd shaped targets for heterostructure growth.
  6. Full manual to automated control, including growth. recipes and parameter logging.

This Section will be updated soon.

This Section will be updated soon.